MaaxCoatting

Plasma Source

Magnetron Sputtering cathode

Benefits

  • High Dynamic Deposition
  • Rate (DDR)
  • High target utilization
  • The optimized uniformity
  • Easy maintenance

Arc Cathode

DLC Coating
Arc Ion Plating

  • Linear Arc Cathode
  • Circular Arc Cathode
Arc cathode is a key component for the DLC and Arc ion plating system. It is able to improve and maximize the target utilization and production capability with optimized design. JYT executes simulating magnetic field, design, etc in order to provide the optimized solution to the customer.

Ion Source

Pretreatment
Assist
DLC

  • Linear Ion Source
Ion Source is a key component in the plasma cleating process, accelerating the ions to the substrates, resulting in physical/chemical reaction to activate the substrate surface for adhesion improvement. JYT provides the customized solution required for surface pretreatment through its own design.

RF ICP Plasma Source

PECVD
PVD
ssist Etching
Cleaning & Activation
PALD – Assist

  • Round Source
  • Linear Source
  • Ring Source
  • Built in Source
Arc cathode is a key component for the DLC and Arc ion plating system. It is able to improve and maximize the target utilization and production capability with optimized design. JYT executes simulating magnetic field, design, etc in order to provide the optimized solution to the customer.